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InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp
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InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp

InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp

  • InP single crystal wafer
  • Orientation: (111)B
  • Size: 2" diameter x 0.35mm
  • Doping: undoped
  • Conducting type: N Type, Semi-Conducting
  • Resistivity: (2-5)E-1 ohm.cm
  • Carrier Concentration:(4.80-5.87)E15 /c.c.
  • Mobility:4030-4570cm^2/v.s
  • Polish: one side polished
  • Ra(Average Roughness) : < 0.4 nm
  • EPD: N/A
  • EPI ready surface and packing

 

 

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$475.65

Original: $1,359.00

-65%
InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp

$1,359.00

$475.65

InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp

  • InP single crystal wafer
  • Orientation: (111)B
  • Size: 2" diameter x 0.35mm
  • Doping: undoped
  • Conducting type: N Type, Semi-Conducting
  • Resistivity: (2-5)E-1 ohm.cm
  • Carrier Concentration:(4.80-5.87)E15 /c.c.
  • Mobility:4030-4570cm^2/v.s
  • Polish: one side polished
  • Ra(Average Roughness) : < 0.4 nm
  • EPD: N/A
  • EPI ready surface and packing

 

 

Related Product

Other InP 

InSb

Other InAs

GaAs


GaSb

Wafer Box

Film Coater

RTP Furnaces



 

 

Product Information

Shipping & Returns

Description

  • InP single crystal wafer
  • Orientation: (111)B
  • Size: 2" diameter x 0.35mm
  • Doping: undoped
  • Conducting type: N Type, Semi-Conducting
  • Resistivity: (2-5)E-1 ohm.cm
  • Carrier Concentration:(4.80-5.87)E15 /c.c.
  • Mobility:4030-4570cm^2/v.s
  • Polish: one side polished
  • Ra(Average Roughness) : < 0.4 nm
  • EPD: N/A
  • EPI ready surface and packing

 

 

Related Product

Other InP 

InSb

Other InAs

GaAs


GaSb

Wafer Box

Film Coater

RTP Furnaces



 

 

InP-VGF Grown (111)B undoped, 2"x0.35 mm wafer, 1sp | MTI Online Store