
InAs (100), Undoped 2" dia x 0.5mm, one side polished
2" InAs wafer (Ntype)
- 2" InAs wafer (Undoped, N type)
- Size: 2" dia x 500 micron +/-25 microns
- Orientation: <100> +/-0.50
- Polishing: one-side polishd
- Packing: in 1000 class clean room with wafer container
Properties
- Growth method LEC
- Orientation (100) +/- 0.5 o
- Doping undoped
- Conductivity type N type
- Carrier Concentration (1-3.0) x10^16/ cm3
- Mobility ~20000 cm 2/Vs
- Resistivity >=1.0x10^-4 ohm.cm
- EPD <10000 / cm 2
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Original: $959.00
-65%$959.00
$335.65InAs (100), Undoped 2" dia x 0.5mm, one side polished
2" InAs wafer (Ntype)
- 2" InAs wafer (Undoped, N type)
- Size: 2" dia x 500 micron +/-25 microns
- Orientation: <100> +/-0.50
- Polishing: one-side polishd
- Packing: in 1000 class clean room with wafer container
Properties
- Growth method LEC
- Orientation (100) +/- 0.5 o
- Doping undoped
- Conductivity type N type
- Carrier Concentration (1-3.0) x10^16/ cm3
- Mobility ~20000 cm 2/Vs
- Resistivity >=1.0x10^-4 ohm.cm
- EPD <10000 / cm 2
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
2" InAs wafer (Ntype)
- 2" InAs wafer (Undoped, N type)
- Size: 2" dia x 500 micron +/-25 microns
- Orientation: <100> +/-0.50
- Polishing: one-side polishd
- Packing: in 1000 class clean room with wafer container
Properties
- Growth method LEC
- Orientation (100) +/- 0.5 o
- Doping undoped
- Conductivity type N type
- Carrier Concentration (1-3.0) x10^16/ cm3
- Mobility ~20000 cm 2/Vs
- Resistivity >=1.0x10^-4 ohm.cm
- EPD <10000 / cm 2
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |











