
InAs (111)A, N type, undoped, 2" in dia x 0.45mm, 1sp
- Growth method LEC
- Orientation (111)A ± 0.5 Deg
- Orientation Flat SEMI
- Doping Undoped
- Conductivity type N type
- Carrier Concentration <2E16 / cm-3
- Mobility >23400 cm2/V.S
- EPD <10000 / cm 2
- Resistivity: 1.3x10^-2 ohm.cm
- Standard thickness 450 ± 25 mm
- Standard diameter 2"± 0.4mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Original: $995.00
-65%$995.00
$348.25InAs (111)A, N type, undoped, 2" in dia x 0.45mm, 1sp
- Growth method LEC
- Orientation (111)A ± 0.5 Deg
- Orientation Flat SEMI
- Doping Undoped
- Conductivity type N type
- Carrier Concentration <2E16 / cm-3
- Mobility >23400 cm2/V.S
- EPD <10000 / cm 2
- Resistivity: 1.3x10^-2 ohm.cm
- Standard thickness 450 ± 25 mm
- Standard diameter 2"± 0.4mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
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Description
- Growth method LEC
- Orientation (111)A ± 0.5 Deg
- Orientation Flat SEMI
- Doping Undoped
- Conductivity type N type
- Carrier Concentration <2E16 / cm-3
- Mobility >23400 cm2/V.S
- EPD <10000 / cm 2
- Resistivity: 1.3x10^-2 ohm.cm
- Standard thickness 450 ± 25 mm
- Standard diameter 2"± 0.4mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |










