
InAs (100), S-doped 10x10x0.5mm, 1sp - IASa101005S1
- Growth method LEC
- Orientation (100)
- Orientation Flat N/A
- Doping S-doped
- Conductivity type N type
- Carrier Concentration 1x10E18 cmE-3
- Mobility 9000 cm2/V.S
- Standard thickness 0.5mm
- Standard size 10mm x 10mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
Original: $189.00
-65%$189.00
$66.15InAs (100), S-doped 10x10x0.5mm, 1sp - IASa101005S1
- Growth method LEC
- Orientation (100)
- Orientation Flat N/A
- Doping S-doped
- Conductivity type N type
- Carrier Concentration 1x10E18 cmE-3
- Mobility 9000 cm2/V.S
- Standard thickness 0.5mm
- Standard size 10mm x 10mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |
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Description
- Growth method LEC
- Orientation (100)
- Orientation Flat N/A
- Doping S-doped
- Conductivity type N type
- Carrier Concentration 1x10E18 cmE-3
- Mobility 9000 cm2/V.S
- Standard thickness 0.5mm
- Standard size 10mm x 10mm
- Polish one-side
Related Product
| Other InAs |
InSb |
InP |
GaAs |
GaSb |
Wafer Box |
Film Coater |
RTP Furnaces |











