
GaAs Wafer - Growing Method: VGF (100) Zn doped Ptype, , 2"x0.35 mm, 1sp, CC: (2.67-3.27) x 10^18 /cm^3
GaAs Wafer - Growing Method: VGF (100) Zn doped Ptype, , 2"x0.35 mm, 1sp, CC: (2.67-3.27) x 10^18 /cm^3
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 2" dia x 0.35mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (2.67-3.27) x 10^18 /cm^3
Mobility: 116-125 cm^2/V.S
EPD: <5000/cm^2
Resistivity: (1.64-1.88)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers
Original: $585.00
-65%$585.00
$204.75GaAs Wafer - Growing Method: VGF (100) Zn doped Ptype, , 2"x0.35 mm, 1sp, CC: (2.67-3.27) x 10^18 /cm^3
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 2" dia x 0.35mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (2.67-3.27) x 10^18 /cm^3
Mobility: 116-125 cm^2/V.S
EPD: <5000/cm^2
Resistivity: (1.64-1.88)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 2" dia x 0.35mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (2.67-3.27) x 10^18 /cm^3
Mobility: 116-125 cm^2/V.S
EPD: <5000/cm^2
Resistivity: (1.64-1.88)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers











