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GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp,
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GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp,

GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp,

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (111)A
  • Primary Flat: US(0-11); Secondary Flat: US(2-1-1)
  • Size: 5 X 5 x 0.5-0.55 mm 
  • Polishing: One side polished
  • Doping: undoped
  • Conductor type: Semi-Insulating
  • Resistivity:(1.51-3.86)E8 ohm.cm
  • Carrier Concentration: N/A
  • Mobility:4120-5860 cm^2/V.S
  • EPD: N/A
  • Ra(Average Roughness) : < 0.4 nm


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$55.65

Original: $159.00

-65%
GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp,

$159.00

$55.65

GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp,

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (111)A
  • Primary Flat: US(0-11); Secondary Flat: US(2-1-1)
  • Size: 5 X 5 x 0.5-0.55 mm 
  • Polishing: One side polished
  • Doping: undoped
  • Conductor type: Semi-Insulating
  • Resistivity:(1.51-3.86)E8 ohm.cm
  • Carrier Concentration: N/A
  • Mobility:4120-5860 cm^2/V.S
  • EPD: N/A
  • Ra(Average Roughness) : < 0.4 nm


Related Products

Other GaAs


InSb

Other InAs

 InP 


GaSb

Wafer Box

Film Coater

RTP Furnaces

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Description

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (111)A
  • Primary Flat: US(0-11); Secondary Flat: US(2-1-1)
  • Size: 5 X 5 x 0.5-0.55 mm 
  • Polishing: One side polished
  • Doping: undoped
  • Conductor type: Semi-Insulating
  • Resistivity:(1.51-3.86)E8 ohm.cm
  • Carrier Concentration: N/A
  • Mobility:4120-5860 cm^2/V.S
  • EPD: N/A
  • Ra(Average Roughness) : < 0.4 nm


Related Products

Other GaAs


InSb

Other InAs

 InP 


GaSb

Wafer Box

Film Coater

RTP Furnaces

GaAs (111)A orientation, Semi-Insulating, undoped, 5x5x 0.5-0.55mm, 1sp, | MTI Online Store