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GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp
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GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp

GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (110)
  • Size: 5 x 5 x 0.35 mm 
  • Polishing: Two  sides polished
  • Doping: Si-doped
  • Conductor type: S-C-N
  • Carrier Concentration: (2.4-3.27)x10E18/cm^3
  • Mobility:  1630-1870 cm^2/V.S
  • Resistivity :( 1.17-1.4)x10^-3 ohm.cm
  • Ra(Average Roughness) : < 0.4 nm
  • Note:  EPI ready wafers



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$62.65

Original: $179.00

-65%
GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp

$179.00

$62.65

GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (110)
  • Size: 5 x 5 x 0.35 mm 
  • Polishing: Two  sides polished
  • Doping: Si-doped
  • Conductor type: S-C-N
  • Carrier Concentration: (2.4-3.27)x10E18/cm^3
  • Mobility:  1630-1870 cm^2/V.S
  • Resistivity :( 1.17-1.4)x10^-3 ohm.cm
  • Ra(Average Roughness) : < 0.4 nm
  • Note:  EPI ready wafers



Related Products

Other GaAs


InSb

Other InAs

 InP 


GaSb

Wafer Box

Film Coater

RTP Furnaces

Product Information

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Description

  • GaAs single crystal wafer
  • Growing Method: VGF
  • Orientation: (110)
  • Size: 5 x 5 x 0.35 mm 
  • Polishing: Two  sides polished
  • Doping: Si-doped
  • Conductor type: S-C-N
  • Carrier Concentration: (2.4-3.27)x10E18/cm^3
  • Mobility:  1630-1870 cm^2/V.S
  • Resistivity :( 1.17-1.4)x10^-3 ohm.cm
  • Ra(Average Roughness) : < 0.4 nm
  • Note:  EPI ready wafers



Related Products

Other GaAs


InSb

Other InAs

 InP 


GaSb

Wafer Box

Film Coater

RTP Furnaces

GaAs, VGF Grown (110) ori. N type, Si-doped, 5 x 5 x 0.3 mm, 2sp | MTI Online Store