
GaAs Wafer - Growing Method: VGF (100), Zn doped, P-Type, 3"x0.5 mm, 1sp
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 3" dia x 0.5mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (5.01-6.30) x 10^17 /cm^3
Mobility: 184-200cm^2/V.S
EPD: <5000/cm^2resistivity: (5.14-6.67)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers
GaAs Wafer - Growing Method: VGF (100), Zn doped, P-Type, 3"x0.5 mm, 1sp
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 3" dia x 0.5mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (5.01-6.30) x 10^17 /cm^3
Mobility: 184-200cm^2/V.S
EPD: <5000/cm^2resistivity: (5.14-6.67)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers
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Product Information
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Description
GaAs single crystal wafer
Growing Method: VGF
Orientation: (100)
Size: 3" dia x 0.5mm
Polishing: one side polished
Doping: Zn doped
Conductor type: S-C-P
Carrier Concentration: (5.01-6.30) x 10^17 /cm^3
Mobility: 184-200cm^2/V.S
EPD: <5000/cm^2resistivity: (5.14-6.67)x10^-2 ohm.cm
Ra(Average Roughness) : < 0.4 nm
Note: EPI ready wafers











