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Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm
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Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm

Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                      (111) +/-0.5 Deg.
  • Wafer Size:                      4" dia x  500 microns  
  • Surface Polishing:             Two  sides  epi polished
  • Surface roughness:           < 30 A ( by AFM)
  • Doping:                            Sb- Doped
  • Conductor type:                N-type
  • Resistivity:                       0.014-0.022 Ohm/cm (If you would like to measure the resistivity accurately, 
                                          please order our
     Portable 4 Probe Resistivity Testing Instrument.)                         
  • Package:                         under 1000 class clean room       

Typical Properties:

  • Structure:                        Cubic, a = 5.6754Å
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                   937.4 oC
  • Thermal Conductivity:        640

 

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$349.65

Original: $999.00

-65%
Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm

$999.00

$349.65

Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                      (111) +/-0.5 Deg.
  • Wafer Size:                      4" dia x  500 microns  
  • Surface Polishing:             Two  sides  epi polished
  • Surface roughness:           < 30 A ( by AFM)
  • Doping:                            Sb- Doped
  • Conductor type:                N-type
  • Resistivity:                       0.014-0.022 Ohm/cm (If you would like to measure the resistivity accurately, 
                                          please order our
     Portable 4 Probe Resistivity Testing Instrument.)                         
  • Package:                         under 1000 class clean room       

Typical Properties:

  • Structure:                        Cubic, a = 5.6754Å
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                   937.4 oC
  • Thermal Conductivity:        640

 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

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Description

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                      (111) +/-0.5 Deg.
  • Wafer Size:                      4" dia x  500 microns  
  • Surface Polishing:             Two  sides  epi polished
  • Surface roughness:           < 30 A ( by AFM)
  • Doping:                            Sb- Doped
  • Conductor type:                N-type
  • Resistivity:                       0.014-0.022 Ohm/cm (If you would like to measure the resistivity accurately, 
                                          please order our
     Portable 4 Probe Resistivity Testing Instrument.)                         
  • Package:                         under 1000 class clean room       

Typical Properties:

  • Structure:                        Cubic, a = 5.6754Å
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                   937.4 oC
  • Thermal Conductivity:        640

 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

Ge Wafer (111) 4" dia x 0.5 mm, 2SP, N type ( Sb- doped)with resistivities: 0.014-0.022 Ohms-cm | MTI Online Store