
Ge Wafer (111) N-type Undoped, 1" dia x 0.5 mm ,1SP, R:>50 ohm.cm
Ge Wafer Specification
- Growing Method: CZ
- Orientation: (111) +/-0.5 Deg.
- Wafer Size: 1" dia x 0.5 mm
- Surface Polishing: one side polished
- Surface roughness: Ra < 10 A ( by AFM)
- Doping: Undoped
- Conductor type: N-type
- Resistivity: >50 Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) - Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640
Original: $269.00
-65%$269.00
$94.15Ge Wafer (111) N-type Undoped, 1" dia x 0.5 mm ,1SP, R:>50 ohm.cm
Ge Wafer Specification
- Growing Method: CZ
- Orientation: (111) +/-0.5 Deg.
- Wafer Size: 1" dia x 0.5 mm
- Surface Polishing: one side polished
- Surface roughness: Ra < 10 A ( by AFM)
- Doping: Undoped
- Conductor type: N-type
- Resistivity: >50 Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) - Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Ge Wafer Specification
- Growing Method: CZ
- Orientation: (111) +/-0.5 Deg.
- Wafer Size: 1" dia x 0.5 mm
- Surface Polishing: one side polished
- Surface roughness: Ra < 10 A ( by AFM)
- Doping: Undoped
- Conductor type: N-type
- Resistivity: >50 Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) - Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640










