
Ge Wafer (110) N-type Undoped, 2" dia x 0.5 mm, 1SP, R:>50 ohm.cm
Ge Wafer Specification
-
Growing Method: CZ
-
Orientation: (110) +/_0.5 Deg.
-
Wafer Size: 2" dia x 500 microns
-
Surface Polishing: one side optical polished
-
Surface finish (RMS or Ra) : < 30A
-
Doping: Undoped
-
Conductor type: N-type
-
Resistivity: > 50Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) -
EPD: < 5E2 /cm^2
-
Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640
Ge Wafer (110) N-type Undoped, 2" dia x 0.5 mm, 1SP, R:>50 ohm.cm
Ge Wafer Specification
-
Growing Method: CZ
-
Orientation: (110) +/_0.5 Deg.
-
Wafer Size: 2" dia x 500 microns
-
Surface Polishing: one side optical polished
-
Surface finish (RMS or Ra) : < 30A
-
Doping: Undoped
-
Conductor type: N-type
-
Resistivity: > 50Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) -
EPD: < 5E2 /cm^2
-
Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Ge Wafer Specification
-
Growing Method: CZ
-
Orientation: (110) +/_0.5 Deg.
-
Wafer Size: 2" dia x 500 microns
-
Surface Polishing: one side optical polished
-
Surface finish (RMS or Ra) : < 30A
-
Doping: Undoped
-
Conductor type: N-type
-
Resistivity: > 50Ohms/cm (If you would like to measure the resistivity accurately,
please order our Portable 4 Probe Resistivity Testing Instrument.) -
EPD: < 5E2 /cm^2
-
Package: under 1000 class clean room
Typical Properties:
- Structure: Cubic, a = 5.6754 A
- Density: 5.323 g/cm3 at room temperature
- Melting Point: 937.4 oC
- Thermal Conductivity: 640











