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Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm
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Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm

Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (110) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           one side  polished
  • Surface roughness:        Ra < 10 A ( by AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm  (If you would like to measure the resistivity accurately, 
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640


 

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$94.15

Original: $269.00

-65%
Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm

$269.00

$94.15

Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (110) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           one side  polished
  • Surface roughness:        Ra < 10 A ( by AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm  (If you would like to measure the resistivity accurately, 
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640


 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

Product Information

Shipping & Returns

Description

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (110) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           one side  polished
  • Surface roughness:        Ra < 10 A ( by AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm  (If you would like to measure the resistivity accurately, 
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640


 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

Ge Wafer (110) N-type Undoped, 1" dia x 0.5 mm , 1SP,R:>50 ohm.cm | MTI Online Store