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Ge Wafer (100)N-type Undoped, 1" dia x 0.5 mm , 2SP,R:>50 ohm.cm - GEUa25D05C2R50
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Ge Wafer (100)N-type Undoped, 1" dia x 0.5 mm , 2SP,R:>50 ohm.cm - GEUa25D05C2R50

Ge Wafer (100)N-type Undoped, 1" dia x 0.5 mm , 2SP,R:>50 ohm.cm - GEUa25D05C2R50

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (100) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           two side epi polished
  • Surface roughness:         RMS or Ra:~ 10 A(By AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm (If you would like to measure the resistivity accurately,
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640

 

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$289.00
Ge Wafer (100)N-type Undoped, 1" dia x 0.5 mm , 2SP,R:>50 ohm.cm - GEUa25D05C2R50
$289.00

Ge Wafer (100)N-type Undoped, 1" dia x 0.5 mm , 2SP,R:>50 ohm.cm - GEUa25D05C2R50

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (100) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           two side epi polished
  • Surface roughness:         RMS or Ra:~ 10 A(By AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm (If you would like to measure the resistivity accurately,
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640

 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

Product Information

Shipping & Returns

Description

Ge Wafer Specification

  • Growing Method:              CZ
  • Orientation:                    (100) +/_0.5 Deg.
  • Wafer Size:                      1" dia x  500 microns  
  • Surface Polishing:           two side epi polished
  • Surface roughness:         RMS or Ra:~ 10 A(By AFM)
  • Doping:                          Undoped
  • Conductor type:              N-type
  • Resistivity:                     >50 Ohms/cm (If you would like to measure the resistivity accurately,
                                        please order our
     Portable 4 Probe Resistivity Testing Instrument.)                     
     
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                       Cubic, a = 5.6754 A
  • Density:                           5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:     640

 

Related Product

Other Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater

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