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3 Heads Plasma Sputtering Coater in Glovebox with RF/DC Power Supplies - VTC-600-3HD-GB
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3 Heads Plasma Sputtering Coater in Glovebox with RF/DC Power Supplies - VTC-600-3HD-GB

3 Heads Plasma Sputtering Coater in Glovebox with RF/DC Power Supplies - VTC-600-3HD-GB

VTC6003HDGB is a three-head plasma sputtering coater in a glovebox (O2 & H2O < 1 ppm). This system is designed for researching solid-state thin-film Lithium batteries, also suitable for sequential coating of multiple-layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, etc.

Features

  • Three 2" magnetron sputtering guns for co-sputtering or layer by layer growth.
  • Choice of RF and DC power sources
  • Integrated with a glovebox (O2 & H2O < 1 ppm)
  • Easy sample transfer inside a glovebox.

SPECIFICATIONS

Power
  • 208-240VAC, single phase, 50/60 Hz, 1500 W

Glovebox VGB-6
  • High-quality purification system ensures O2 and H2O below 1 PPM
  • Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
  • Hinged-type front door for loading devices and samples easily
  • Automatic purging to evacuate air before recirculating purification
  • Automatic regeneration function
  • Two Antechambers for large and small samples delivery
DC/RF Power Supplies
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials


Magnetron Sputtering Head
  • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
    • Two are connected to DC sources for metallic materials
    • One is connected to the RF source for non-conductive materials
    • Target size: 2" diameter with a thickness of 0.1 - 5 mm
    • Sputtering targets are optional
    • Recommended Sputtering Recipe and Useful Tips
  •  




Vacuum Chamber
  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
  •     



Sample Stage
  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas & Flow Control
  • Two mass flow controllers (MFC)
    • Flow rate: 0 – 200 sccm
    • nitrogen calibrated
  • 1/4" vent port.

Vacuum Pumping Station

(Optional)
  • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
  • Turbo pump . 
    • 63 L/s turbomolecular pump, or
    • 260 L/s turbomolecular pump
  • Backing pump
    • 240 L/min rotary vane pump, or
    • 200 L/min dry scroll pump

Water Chiller

(Optional)
  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)
  • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

Compliance
  • CE approval
  • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

 

$145,985.00
3 Heads Plasma Sputtering Coater in Glovebox with RF/DC Power Supplies - VTC-600-3HD-GB—
$145,985.00

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3 Heads Plasma Sputtering Coater in Glovebox with RF/DC Power Supplies - VTC-600-3HD-GB

VTC6003HDGB is a three-head plasma sputtering coater in a glovebox (O2 & H2O < 1 ppm). This system is designed for researching solid-state thin-film Lithium batteries, also suitable for sequential coating of multiple-layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, etc.

Features

  • Three 2" magnetron sputtering guns for co-sputtering or layer by layer growth.
  • Choice of RF and DC power sources
  • Integrated with a glovebox (O2 & H2O < 1 ppm)
  • Easy sample transfer inside a glovebox.

SPECIFICATIONS

Power
  • 208-240VAC, single phase, 50/60 Hz, 1500 W

Glovebox VGB-6
  • High-quality purification system ensures O2 and H2O below 1 PPM
  • Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
  • Hinged-type front door for loading devices and samples easily
  • Automatic purging to evacuate air before recirculating purification
  • Automatic regeneration function
  • Two Antechambers for large and small samples delivery
DC/RF Power Supplies
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials


Magnetron Sputtering Head
  • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
    • Two are connected to DC sources for metallic materials
    • One is connected to the RF source for non-conductive materials
    • Target size: 2" diameter with a thickness of 0.1 - 5 mm
    • Sputtering targets are optional
    • Recommended Sputtering Recipe and Useful Tips
  •  




Vacuum Chamber
  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
  •     



Sample Stage
  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas & Flow Control
  • Two mass flow controllers (MFC)
    • Flow rate: 0 – 200 sccm
    • nitrogen calibrated
  • 1/4" vent port.

Vacuum Pumping Station

(Optional)
  • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
  • Turbo pump . 
    • 63 L/s turbomolecular pump, or
    • 260 L/s turbomolecular pump
  • Backing pump
    • 240 L/min rotary vane pump, or
    • 200 L/min dry scroll pump

Water Chiller

(Optional)
  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)
  • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

Compliance
  • CE approval
  • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

 

Product Information

Shipping & Returns

Description

VTC6003HDGB is a three-head plasma sputtering coater in a glovebox (O2 & H2O < 1 ppm). This system is designed for researching solid-state thin-film Lithium batteries, also suitable for sequential coating of multiple-layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, etc.

Features

  • Three 2" magnetron sputtering guns for co-sputtering or layer by layer growth.
  • Choice of RF and DC power sources
  • Integrated with a glovebox (O2 & H2O < 1 ppm)
  • Easy sample transfer inside a glovebox.

SPECIFICATIONS

Power
  • 208-240VAC, single phase, 50/60 Hz, 1500 W

Glovebox VGB-6
  • High-quality purification system ensures O2 and H2O below 1 PPM
  • Stainless steel chamber, 1200 mm L x 740 mm W x 900 mm H
  • Hinged-type front door for loading devices and samples easily
  • Automatic purging to evacuate air before recirculating purification
  • Automatic regeneration function
  • Two Antechambers for large and small samples delivery
DC/RF Power Supplies
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials


Magnetron Sputtering Head
  • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
    • Two are connected to DC sources for metallic materials
    • One is connected to the RF source for non-conductive materials
    • Target size: 2" diameter with a thickness of 0.1 - 5 mm
    • Sputtering targets are optional
    • Recommended Sputtering Recipe and Useful Tips
  •  




Vacuum Chamber
  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
  •     



Sample Stage
  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas & Flow Control
  • Two mass flow controllers (MFC)
    • Flow rate: 0 – 200 sccm
    • nitrogen calibrated
  • 1/4" vent port.

Vacuum Pumping Station

(Optional)
  • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station is recommended
  • Turbo pump . 
    • 63 L/s turbomolecular pump, or
    • 260 L/s turbomolecular pump
  • Backing pump
    • 240 L/min rotary vane pump, or
    • 200 L/min dry scroll pump

Water Chiller

(Optional)
  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)
  • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

Compliance
  • CE approval
  • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

 

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