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Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS
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Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS

Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS

AlN  Template on Silicon is made by a PVDNC method.  AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Useful area: 90%
  • Nominal AlN thickness: 200nm ± 5%, one side coated, undoped AlN film
  • Front Surface: As-grown
  • Back surface: Silicon as received
  • AlN orientation: C-plane (00.1)
  • Macro Defect Density: <5/cm^2
  • Wafer base: Silicon [111] N type,  2" dia x0.5 mm, Resistivity: <5 ohm-cm, one side polished

 Related data
  •   AlN MSDS

     

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$241.50

Original: $690.00

-65%
Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS—

$690.00

$241.50

Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS

AlN  Template on Silicon is made by a PVDNC method.  AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Useful area: 90%
  • Nominal AlN thickness: 200nm ± 5%, one side coated, undoped AlN film
  • Front Surface: As-grown
  • Back surface: Silicon as received
  • AlN orientation: C-plane (00.1)
  • Macro Defect Density: <5/cm^2
  • Wafer base: Silicon [111] N type,  2" dia x0.5 mm, Resistivity: <5 ohm-cm, one side polished

 Related data
  •   AlN MSDS

     

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

Product Information

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Description

AlN  Template on Silicon is made by a PVDNC method.  AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Useful area: 90%
  • Nominal AlN thickness: 200nm ± 5%, one side coated, undoped AlN film
  • Front Surface: As-grown
  • Back surface: Silicon as received
  • AlN orientation: C-plane (00.1)
  • Macro Defect Density: <5/cm^2
  • Wafer base: Silicon [111] N type,  2" dia x0.5 mm, Resistivity: <5 ohm-cm, one side polished

 Related data
  •   AlN MSDS

     

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater
Undoped AlN Template on 2" Silicon ( Si <111> , N type ) 2"x 200 nm - FmAlNonSiPc50D05C1FT200nmUS | MTI Online Store