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Undoped AlN Template on Sapphire(0001) 10x10mmx5000nm

Undoped AlN Template on Sapphire(0001) 10x10mmx5000nm

Undoped AlN Template on Sapphire(0001) 10x10mmx5000nm

AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

Sizes 10mmx10mm
Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
Type and Doping for the AlN film: Undoped, Semi-insulating
Macro Defect Density: <5 cm^-2
Front Surface Finish (Al Face): As-grown
Back Surface Finish Sapphire as-received finish
Useable Surface Area >90%
Edge Exclusion Area 1mm
Package Single Wafer Container
AlN layer thickness 5000 nm +/- 5%

Related data

For Surface Rughness and XRD data, Please click here.

AlN MSDS

Related Products


Thin Films A-Z	Crystal wafer A-Z	Plasma Cleaner	Wafer Containers	Dicing saw	Film Coater

$90.30

Original: $258.00

-65%

Undoped AlN Template on Sapphire(0001) 10x10mmx5000nm—

$258.00

$90.30

Undoped AlN Template on Sapphire(0001) 10x10mmx5000nm

AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

Sizes 10mmx10mm
Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
Type and Doping for the AlN film: Undoped, Semi-insulating
Macro Defect Density: <5 cm^-2
Front Surface Finish (Al Face): As-grown
Back Surface Finish Sapphire as-received finish
Useable Surface Area >90%
Edge Exclusion Area 1mm
Package Single Wafer Container
AlN layer thickness 5000 nm +/- 5%

Related data

For Surface Rughness and XRD data, Please click here.

AlN MSDS

Related Products


Thin Films A-Z	Crystal wafer A-Z	Plasma Cleaner	Wafer Containers	Dicing saw	Film Coater

Product Information

Shipping & Returns

Description

AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

Sizes 10mmx10mm
Substrate Sapphire Orientation: c axis (0001) +/- 1.0 deg.
Type and Doping for the AlN film: Undoped, Semi-insulating
Macro Defect Density: <5 cm^-2
Front Surface Finish (Al Face): As-grown
Back Surface Finish Sapphire as-received finish
Useable Surface Area >90%
Edge Exclusion Area 1mm
Package Single Wafer Container
AlN layer thickness 5000 nm +/- 5%

Related data

For Surface Rughness and XRD data, Please click here.

AlN MSDS

Related Products


Thin Films A-Z	Crystal wafer A-Z	Plasma Cleaner	Wafer Containers	Dicing saw	Film Coater

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