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Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm
Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm
AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.
Specifications
- Useful area: 90%
- Nominal AlN thickness: 200nm ±10%, one side coated, undoped AlN film
- Front Surface: <1nm RMS, as-grown
-
Back surface: silicon as received
-
AlN orientation: c-plane (00.1)
-
Macro Defect Density: <1/cm^2
-
Wafer base: Silicon [111] P-type, 10x10 x0.5 mm, one side polished
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$69.30
Original: $198.00
-65%Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm—
$198.00
$69.30Undoped AlN Template on Silicon ( Si <111> P type ) 10mmx10mm x 200 nm - FmAlNonSiBc101005S1FT200nm
AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.
Specifications
- Useful area: 90%
- Nominal AlN thickness: 200nm ±10%, one side coated, undoped AlN film
- Front Surface: <1nm RMS, as-grown
-
Back surface: silicon as received
-
AlN orientation: c-plane (00.1)
-
Macro Defect Density: <1/cm^2
-
Wafer base: Silicon [111] P-type, 10x10 x0.5 mm, one side polished
Related documents
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Description
AlN Template on Silicon is made by a PVDNC method. AlN template on Silicon is a cost effective way to replace AlN single crystal substrate.
Specifications
- Useful area: 90%
- Nominal AlN thickness: 200nm ±10%, one side coated, undoped AlN film
- Front Surface: <1nm RMS, as-grown
-
Back surface: silicon as received
-
AlN orientation: c-plane (00.1)
-
Macro Defect Density: <1/cm^2
-
Wafer base: Silicon [111] P-type, 10x10 x0.5 mm, one side polished
Related documents
