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DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD
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DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD

DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD

VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.

SPECIFICATIONS

Power
  • 208-240 VAC, single phase, 50/60 Hz, 1500 W
Sputtering Power Sources
  • Three sputtering power sources
    • Two DC source: 500 W power for coating metallic materials 
    • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
    • Other combinations are available upon request.

Magnetron Sputtering Head
  • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
    • Two are connected to DC sources for metallic materials
    • One is connected to the RF source for non-conductive materials
    • Target size: 2" diameter with a thickness of 0.1 - 5 mm
    • Sputtering targets are optional
    • Recommended Sputtering Recipe and Useful Tips
  • 2 RF heads model is available
  • Extra 148 cm RF cable can be ordered at extra cost for the replacement
  • Four heads sputtering system is available upon request




Vacuum Chamber
  • Stainless steel vacuum chamber: Ø300 × 300 mm H
  • One 100 mm glass view port. 
  • Hinged type top flange for easy sample access
  • Here is a glance of the vacuum chamber
  •     




Sample Stage
  • Ø140 mm rotating and heating sample stage up to 500°C 
  • Rotation speed: 1 - 20 rpm
  • Single-point programmable temperature controller

Gas Flow Control
  • Three mass flow controllers (MFC)
    • Flow rate: 0 – 200 sccm
    • nitrogen calibrated
  • 1/4" vent port.

Vacuum Pump Station

(Optional)
  • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station (turbo + backing pumps) is recommended
  • Turbo pump . 
    • 63 L/s turbomolecular pump, or
    • 260 L/s turbomolecular pump
  • Backing pump
    • 240 L/min rotary vane pump, or
    • 200 L/min dry scroll pump

Water Chiller

(Optional)
  • Chilled water is required
  • One digital temperature-controlled recirculating water chiller is recommended
    • Refrigeration range: 5~35 °C
    • Flow rate: 16 L/min
    • Pump pressure: 14 psi

Film Thickness Measurement

(Optional)
  • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

    Compliance
    • CE approval
    • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

    Application Note
    • This coater may be placed into a standard glovebox with modification for thin-film battery research

     

    $115,985.00
    DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD—
    $115,985.00

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    DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD - Image 2

    DC/RF 3-head High Vacuum 2” Magnetron Plasma Sputtering Coater - VTC-600-3HD-LD

    VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.

    SPECIFICATIONS

    Power
    • 208-240 VAC, single phase, 50/60 Hz, 1500 W
    Sputtering Power Sources
    • Three sputtering power sources
      • Two DC source: 500 W power for coating metallic materials 
      • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
      • Other combinations are available upon request.

    Magnetron Sputtering Head
    • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
      • Two are connected to DC sources for metallic materials
      • One is connected to the RF source for non-conductive materials
      • Target size: 2" diameter with a thickness of 0.1 - 5 mm
      • Sputtering targets are optional
      • Recommended Sputtering Recipe and Useful Tips
    • 2 RF heads model is available
    • Extra 148 cm RF cable can be ordered at extra cost for the replacement
    • Four heads sputtering system is available upon request




    Vacuum Chamber
    • Stainless steel vacuum chamber: Ø300 × 300 mm H
    • One 100 mm glass view port. 
    • Hinged type top flange for easy sample access
    • Here is a glance of the vacuum chamber
    •     




    Sample Stage
    • Ø140 mm rotating and heating sample stage up to 500°C 
    • Rotation speed: 1 - 20 rpm
    • Single-point programmable temperature controller

    Gas Flow Control
    • Three mass flow controllers (MFC)
      • Flow rate: 0 – 200 sccm
      • nitrogen calibrated
    • 1/4" vent port.

    Vacuum Pump Station

    (Optional)
    • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station (turbo + backing pumps) is recommended
    • Turbo pump . 
      • 63 L/s turbomolecular pump, or
      • 260 L/s turbomolecular pump
    • Backing pump
      • 240 L/min rotary vane pump, or
      • 200 L/min dry scroll pump

    Water Chiller

    (Optional)
    • Chilled water is required
    • One digital temperature-controlled recirculating water chiller is recommended
      • Refrigeration range: 5~35 °C
      • Flow rate: 16 L/min
      • Pump pressure: 14 psi

    Film Thickness Measurement

    (Optional)
    • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

      Compliance
      • CE approval
      • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

      Application Note
      • This coater may be placed into a standard glovebox with modification for thin-film battery research

       

      Product Information

      Shipping & Returns

      Description

      VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.

      SPECIFICATIONS

      Power
      • 208-240 VAC, single phase, 50/60 Hz, 1500 W
      Sputtering Power Sources
      • Three sputtering power sources
        • Two DC source: 500 W power for coating metallic materials 
        • One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
        • Other combinations are available upon request.

      Magnetron Sputtering Head
      • Three 2" Magnetron Sputtering Heads with water cooling jackets and shutters
        • Two are connected to DC sources for metallic materials
        • One is connected to the RF source for non-conductive materials
        • Target size: 2" diameter with a thickness of 0.1 - 5 mm
        • Sputtering targets are optional
        • Recommended Sputtering Recipe and Useful Tips
      • 2 RF heads model is available
      • Extra 148 cm RF cable can be ordered at extra cost for the replacement
      • Four heads sputtering system is available upon request




      Vacuum Chamber
      • Stainless steel vacuum chamber: Ø300 × 300 mm H
      • One 100 mm glass view port. 
      • Hinged type top flange for easy sample access
      • Here is a glance of the vacuum chamber
      •     




      Sample Stage
      • Ø140 mm rotating and heating sample stage up to 500°C 
      • Rotation speed: 1 - 20 rpm
      • Single-point programmable temperature controller

      Gas Flow Control
      • Three mass flow controllers (MFC)
        • Flow rate: 0 – 200 sccm
        • nitrogen calibrated
      • 1/4" vent port.

      Vacuum Pump Station

      (Optional)
      • For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station (turbo + backing pumps) is recommended
      • Turbo pump . 
        • 63 L/s turbomolecular pump, or
        • 260 L/s turbomolecular pump
      • Backing pump
        • 240 L/min rotary vane pump, or
        • 200 L/min dry scroll pump

      Water Chiller

      (Optional)
      • Chilled water is required
      • One digital temperature-controlled recirculating water chiller is recommended
        • Refrigeration range: 5~35 °C
        • Flow rate: 16 L/min
        • Pump pressure: 14 psi

      Film Thickness Measurement

      (Optional)
      • Quartz crystal microbalance for in-situ film thickness measurement is optional. Accuracy up to 1Å

        Compliance
        • CE approval
        • NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.

        Application Note
        • This coater may be placed into a standard glovebox with modification for thin-film battery research