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3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6
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3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6

3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6

EQ-PCE-6 is a medium plasma cleaner with 6" Dia x 6.5"Length quartz chamber.  It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve better quality.  If you don't have experience with plasma surface cleaning, please refer to the articles as follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.

SPECIFICATIONS

Input Power
  • AC 220V, 50/60 Hz, (You may order a transformer to operate at 110V)
  • RF Power:    30 W Max.
  • Vacuum Pump:   < 500W
  • Total Power:    < 600W
RF Power
  • RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels: Low Setting 7.2W; Medium Setting 10.2W; High Setting 30W
  • RF frequency:   13,56 MHz
Control Panel
  • Control Function: Clean time, RF Power, Vacuum Pump.
Plasma Chamber
  • 6" diameter x 6.5" length quartz chamber
  • 3 Liter Capacity
  • Hinged type door with viewing window for easy sample loading and observing
Vacuum Pump 
  • One Double-Stage Rotary Vane Vacuum Pump (156 L/m ) with Exhaust filter and vacuum pipe are included for the equipment
  • Both 110V or 220V are available, please specify when purchase.
Inert Gas
  • Different gases can be chosen for plasma cleaning such as N2, Ar, air, and mixed gas.
  • No flammable gas should be used for the plasma cleaner
Optional
 
  • Combinations of PCE-6 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture left for Two-Channel Gas Mixer. 
Dimensions
    • 400mm L ×300mm W ×300mm H
    • 16" x 12" x 12" (inch)
    Net Weight       30 Lbs
    Shipping Weight & Dimensions
    • 140 lbs
    • 40"x30"x23"
    Warranty       One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
    Application Note       Positive Pressure may damage Plasma Quartz Chamber. 
    Operation Manual      
              

     

    $13,998.00
    3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6—
    $13,998.00

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    3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6 - Image 2
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    3 L Plasma Cleaner with Vacuum Pump & Digital Controller, 6"Dx6.5"L Quartz Chamber - PCE6

    EQ-PCE-6 is a medium plasma cleaner with 6" Dia x 6.5"Length quartz chamber.  It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve better quality.  If you don't have experience with plasma surface cleaning, please refer to the articles as follows:
    • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
    • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
    • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.

    SPECIFICATIONS

    Input Power
    • AC 220V, 50/60 Hz, (You may order a transformer to operate at 110V)
    • RF Power:    30 W Max.
    • Vacuum Pump:   < 500W
    • Total Power:    < 600W
    RF Power
    • RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels: Low Setting 7.2W; Medium Setting 10.2W; High Setting 30W
    • RF frequency:   13,56 MHz
    Control Panel
    • Control Function: Clean time, RF Power, Vacuum Pump.
    Plasma Chamber
    • 6" diameter x 6.5" length quartz chamber
    • 3 Liter Capacity
    • Hinged type door with viewing window for easy sample loading and observing
    Vacuum Pump 
    • One Double-Stage Rotary Vane Vacuum Pump (156 L/m ) with Exhaust filter and vacuum pipe are included for the equipment
    • Both 110V or 220V are available, please specify when purchase.
    Inert Gas
    • Different gases can be chosen for plasma cleaning such as N2, Ar, air, and mixed gas.
    • No flammable gas should be used for the plasma cleaner
    Optional
     
    • Combinations of PCE-6 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture left for Two-Channel Gas Mixer. 
    Dimensions
      • 400mm L ×300mm W ×300mm H
      • 16" x 12" x 12" (inch)
      Net Weight       30 Lbs
      Shipping Weight & Dimensions
      • 140 lbs
      • 40"x30"x23"
      Warranty       One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
      Application Note       Positive Pressure may damage Plasma Quartz Chamber. 
      Operation Manual      
                

       

      Product Information

      Shipping & Returns

      Description

      EQ-PCE-6 is a medium plasma cleaner with 6" Dia x 6.5"Length quartz chamber.  It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve better quality.  If you don't have experience with plasma surface cleaning, please refer to the articles as follows:
      • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
      • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
      • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.

      SPECIFICATIONS

      Input Power
      • AC 220V, 50/60 Hz, (You may order a transformer to operate at 110V)
      • RF Power:    30 W Max.
      • Vacuum Pump:   < 500W
      • Total Power:    < 600W
      RF Power
      • RF power (High voltage & high-frequency current applied on the coil) is adjustable at three levels: Low Setting 7.2W; Medium Setting 10.2W; High Setting 30W
      • RF frequency:   13,56 MHz
      Control Panel
      • Control Function: Clean time, RF Power, Vacuum Pump.
      Plasma Chamber
      • 6" diameter x 6.5" length quartz chamber
      • 3 Liter Capacity
      • Hinged type door with viewing window for easy sample loading and observing
      Vacuum Pump 
      • One Double-Stage Rotary Vane Vacuum Pump (156 L/m ) with Exhaust filter and vacuum pipe are included for the equipment
      • Both 110V or 220V are available, please specify when purchase.
      Inert Gas
      • Different gases can be chosen for plasma cleaning such as N2, Ar, air, and mixed gas.
      • No flammable gas should be used for the plasma cleaner
      Optional
       
      • Combinations of PCE-6 plasma cleaner with Two Channel Gas Mixer will be a solution for introducing up to two process gases. Order plasma cleaner with the two-channel gas mixer from product options or Click the picture left for Two-Channel Gas Mixer. 
      Dimensions
        • 400mm L ×300mm W ×300mm H
        • 16" x 12" x 12" (inch)
        Net Weight       30 Lbs
        Shipping Weight & Dimensions
        • 140 lbs
        • 40"x30"x23"
        Warranty       One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
        Application Note       Positive Pressure may damage Plasma Quartz Chamber. 
        Operation Manual