OTF-1200X-S-Mist is a compact and economic MIST CVD system, also called Aerosol-assisted chemical vapor deposition (AACVD), for epitaxial thin film or single crystal growth up to 1200ºC. The furnace is integrated with a 1.7MHz ultrasonic mist generator and 2 2-channel gas delivery system
Furnace
The splittable tube furnace with 1200oC Max. working temperature
200 mm length heating zone with 60 mm length constant temperature zone.
30 segments programmable temperature controller with +/- 1ºC accuracy
Power: 1.2 KW, 120VAC ( +/- 10% single phase 50/60Hz
Click the picture left to see detailed specs
Quartz Tube & Sample Holder
Quartz processing tube with flanges and the size of OD 60 mm x ID 55 mm x L 600 mm is included
One quartz sample holder is included, which can hold 4 pcs of 10x10x0.5 mm substrate at 45 degrees.
Click the Picture left to order a spare
Ultrasonic Mist Generator
1.7 MHz ultrasonic generator is located in an airtight SS316 tank. ( click Pic left for specs )
3 levels of power output ( low = "1", liquid injection speed = 0.2 mL/min), (middle = "2", liquid injection speed = 0.4 mL/min), (high ="3", liquid injection speed = 0.6 mL/min). To achieve high atomizing quality, the syringe pump rate should be match the power output level.
7 levels of time setting ("Out" indicator light), "1" = no limited timing, "2" = 30 min, "3"= 60 min, "4"= 90 min, "5"= 120 min, "6"= 150 min, "7" = 180 min
A liquid syringe pump is equipped to inject automatically, which comes with a 20 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min
The temperature heating function is additionally installed upon request. The max. temperature can be up to 250 °C
The mist generator is connected to a tube furnace via 1/4" stainless steel tube
Gas Delivery System
Two floating Flow-meter with a flow rate ranging from 16 to 160 mL/min
One stainless steel mix tank built inside for better gas mixing
Three Pipe fittings for 1/4" pipe (nylon or stainless steel)
Three vacuum needle valves made of SS304
Vacuum Pump ( optional )
KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump
A dry pump is strongly recommended for the longer service life of Mist CVD.
Please click the picture left to order a pump if you need
Application
This kind of mist CVD can be used to grow Ga2O3 crystal with high quality
Compliance
CE Certified
NRTL or CSA certification is available at extra cost.
Reference article
EPITAXIAL GROWTH OF Γ-GA2O3 FILMS BY MIST CHEMICAL VAPOR DEPOSITION
OTF-1200X-S-Mist is a compact and economic MIST CVD system, also called Aerosol-assisted chemical vapor deposition (AACVD), for epitaxial thin film or single crystal growth up to 1200ºC. The furnace is integrated with a 1.7MHz ultrasonic mist generator and 2 2-channel gas delivery system
Furnace
The splittable tube furnace with 1200oC Max. working temperature
200 mm length heating zone with 60 mm length constant temperature zone.
30 segments programmable temperature controller with +/- 1ºC accuracy
Power: 1.2 KW, 120VAC ( +/- 10% single phase 50/60Hz
Click the picture left to see detailed specs
Quartz Tube & Sample Holder
Quartz processing tube with flanges and the size of OD 60 mm x ID 55 mm x L 600 mm is included
One quartz sample holder is included, which can hold 4 pcs of 10x10x0.5 mm substrate at 45 degrees.
Click the Picture left to order a spare
Ultrasonic Mist Generator
1.7 MHz ultrasonic generator is located in an airtight SS316 tank. ( click Pic left for specs )
3 levels of power output ( low = "1", liquid injection speed = 0.2 mL/min), (middle = "2", liquid injection speed = 0.4 mL/min), (high ="3", liquid injection speed = 0.6 mL/min). To achieve high atomizing quality, the syringe pump rate should be match the power output level.
7 levels of time setting ("Out" indicator light), "1" = no limited timing, "2" = 30 min, "3"= 60 min, "4"= 90 min, "5"= 120 min, "6"= 150 min, "7" = 180 min
A liquid syringe pump is equipped to inject automatically, which comes with a 20 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min
The temperature heating function is additionally installed upon request. The max. temperature can be up to 250 °C
The mist generator is connected to a tube furnace via 1/4" stainless steel tube
Gas Delivery System
Two floating Flow-meter with a flow rate ranging from 16 to 160 mL/min
One stainless steel mix tank built inside for better gas mixing
Three Pipe fittings for 1/4" pipe (nylon or stainless steel)
Three vacuum needle valves made of SS304
Vacuum Pump ( optional )
KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump
A dry pump is strongly recommended for the longer service life of Mist CVD.
Please click the picture left to order a pump if you need
Application
This kind of mist CVD can be used to grow Ga2O3 crystal with high quality
Compliance
CE Certified
NRTL or CSA certification is available at extra cost.
Reference article
EPITAXIAL GROWTH OF Γ-GA2O3 FILMS BY MIST CHEMICAL VAPOR DEPOSITION
OTF-1200X-S-Mist is a compact and economic MIST CVD system, also called Aerosol-assisted chemical vapor deposition (AACVD), for epitaxial thin film or single crystal growth up to 1200ºC. The furnace is integrated with a 1.7MHz ultrasonic mist generator and 2 2-channel gas delivery system
Furnace
The splittable tube furnace with 1200oC Max. working temperature
200 mm length heating zone with 60 mm length constant temperature zone.
30 segments programmable temperature controller with +/- 1ºC accuracy
Power: 1.2 KW, 120VAC ( +/- 10% single phase 50/60Hz
Click the picture left to see detailed specs
Quartz Tube & Sample Holder
Quartz processing tube with flanges and the size of OD 60 mm x ID 55 mm x L 600 mm is included
One quartz sample holder is included, which can hold 4 pcs of 10x10x0.5 mm substrate at 45 degrees.
Click the Picture left to order a spare
Ultrasonic Mist Generator
1.7 MHz ultrasonic generator is located in an airtight SS316 tank. ( click Pic left for specs )
3 levels of power output ( low = "1", liquid injection speed = 0.2 mL/min), (middle = "2", liquid injection speed = 0.4 mL/min), (high ="3", liquid injection speed = 0.6 mL/min). To achieve high atomizing quality, the syringe pump rate should be match the power output level.
7 levels of time setting ("Out" indicator light), "1" = no limited timing, "2" = 30 min, "3"= 60 min, "4"= 90 min, "5"= 120 min, "6"= 150 min, "7" = 180 min
A liquid syringe pump is equipped to inject automatically, which comes with a 20 ml plastic syringe. The speed range for the liquid injection pump is 0.004 ml/min - 70 ml/min
The temperature heating function is additionally installed upon request. The max. temperature can be up to 250 °C
The mist generator is connected to a tube furnace via 1/4" stainless steel tube
Gas Delivery System
Two floating Flow-meter with a flow rate ranging from 16 to 160 mL/min
One stainless steel mix tank built inside for better gas mixing
Three Pipe fittings for 1/4" pipe (nylon or stainless steel)
Three vacuum needle valves made of SS304
Vacuum Pump ( optional )
KF 25 vacuum port is installed on the flange of the processing tube with a valve to connect to a vacuum pump
A dry pump is strongly recommended for the longer service life of Mist CVD.
Please click the picture left to order a pump if you need
Application
This kind of mist CVD can be used to grow Ga2O3 crystal with high quality
Compliance
CE Certified
NRTL or CSA certification is available at extra cost.
Reference article
EPITAXIAL GROWTH OF Γ-GA2O3 FILMS BY MIST CHEMICAL VAPOR DEPOSITION
