
CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 1sp - FmCeO2onYSZc101005S1FT40nm
Epitaxial thin Film Composition |
<111>° CeO2 |
Epitaxial Film Thickness |
40 nm +/- 10 nm |
Epitaxial FWHM |
< 5 oĀ Ā +/- 1o |
Substrate |
<111>, YSZ, 10x10x0.5 mm, one side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
|
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CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 1sp - FmCeO2onYSZc101005S1FT40nm
Epitaxial thin Film Composition |
<111>° CeO2 |
Epitaxial Film Thickness |
40 nm +/- 10 nm |
Epitaxial FWHM |
< 5 oĀ Ā +/- 1o |
Substrate |
<111>, YSZ, 10x10x0.5 mm, one side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
|
Related Products
Thin Films Ā A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Ā Wafer Containers |
Dicing saw |
Film Coater |
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Epitaxial thin Film Composition |
<111>° CeO2 |
Epitaxial Film Thickness |
40 nm +/- 10 nm |
Epitaxial FWHM |
< 5 oĀ Ā +/- 1o |
Substrate |
<111>, YSZ, 10x10x0.5 mm, one side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
|
Related Products
Thin Films Ā A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Ā Wafer Containers |
Dicing saw |
Film Coater |


