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CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nm
Specifications
| Epitaxial thin Film Composition |
<100> CeO2 |
| Epitaxial Film Thickness | 40 nm +/- 10 nm |
| Growth method | Spin coating |
| Epitaxial FWHM |
< 5 o |
Substrate |
<100>, YSZ, 10x10x0.5 mm, two side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
| Typical XRD and Rocking curve (click thumb pic to enlarge ) |
  |
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$399.00
CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nm—
$399.00
CeO2 Film (40 nm one side) on YSZ <100> 10x10x0.5 mm,2sp - FmCeO2onYSZa101005S2FT40nm
Specifications
| Epitaxial thin Film Composition |
<100> CeO2 |
| Epitaxial Film Thickness | 40 nm +/- 10 nm |
| Growth method | Spin coating |
| Epitaxial FWHM |
< 5 o |
Substrate |
<100>, YSZ, 10x10x0.5 mm, two side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
| Typical XRD and Rocking curve (click thumb pic to enlarge ) |
|
Related Products
|
|
|
|
|
|
|
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Specifications
| Epitaxial thin Film Composition |
<100> CeO2 |
| Epitaxial Film Thickness | 40 nm +/- 10 nm |
| Growth method | Spin coating |
| Epitaxial FWHM |
< 5 o |
Substrate |
<100>, YSZ, 10x10x0.5 mm, two side polished |
Package |
Sealed in Vacuum in a plastic box and bag |
| Typical XRD and Rocking curve (click thumb pic to enlarge ) |
|
Related Products
|
|
|
|
|
|
|
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
