CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 2sp - FmCeO2onYSZc101005S2FT40nm
Specifications
|
Epitaxial thin Film Composition |
<111>° CeO2 |
|
Epitaxial Film Thickness |
40 nm +/- 10 nm |
|
Epitaxial FWHM |
< 5 o +/- 1o |
|
Substrate |
<111>, YSZ, 10x10x0.5 mm, two sides polished |
|
Package |
Sealed in Vacuum in a plastic box and bag |
|
|
|
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|
|
|
|
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CeO2 Film (40 nm one side) on YSZ, <111>10x10x0.5 mm, 2sp - FmCeO2onYSZc101005S2FT40nm
Specifications
|
Epitaxial thin Film Composition |
<111>° CeO2 |
|
Epitaxial Film Thickness |
40 nm +/- 10 nm |
|
Epitaxial FWHM |
< 5 o +/- 1o |
|
Substrate |
<111>, YSZ, 10x10x0.5 mm, two sides polished |
|
Package |
Sealed in Vacuum in a plastic box and bag |
|
|
|
Related Products
|
|
|
|
|
|
|
|
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
Specifications
|
Epitaxial thin Film Composition |
<111>° CeO2 |
|
Epitaxial Film Thickness |
40 nm +/- 10 nm |
|
Epitaxial FWHM |
< 5 o +/- 1o |
|
Substrate |
<111>, YSZ, 10x10x0.5 mm, two sides polished |
|
Package |
Sealed in Vacuum in a plastic box and bag |
|
|
|
Related Products
|
|
|
|
|
|
|
|
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
