
1100°C Tube Furnace with Solid Precursor Sublimator for CVD 2D Layers of TMDs - OTF-1200X-4-NW-UL
1100°C Tube Furnace with Solid Precursor Sublimator for CVD 2D Layers of TMDs - OTF-1200X-4-NW-UL
OTF-1200X-4-NW-UL is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichalcogenides (TMD )such as MoSe2, MoS2... and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter.
Specifications
Furnace and Preheater Pic. 1 Pic. 2 |
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| Rated Voltage | Single Phase, 208-240 VAC, 50/60 Hz, AWG 8# Power cord is included (without plug) | ||
| Power consumption | Max. 3600 W (20 A breaker required) | ||
Heating Zone |
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Working Temperature |
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Temperature Control |
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Vacuum and Gas Sealing & Flange |
The right flange of the CVD furnace
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| The optional Liquid Injection device optional) | For direct liquid CVD ( DLCVD), you may consider the below devices for liquid injection: ( click Pic to order ) ![]() |
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| Net weight |
110kg |
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| Dimensions |
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| Shipping Weight & Dimensions |
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| Warranty |
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Laptop, software & WiFi Control (Optional) ![]() |
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| Compliance |
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| Warning |
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Operation Demo Video ![]() |
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Original: $29,950.00
-65%$29,950.00
$10,482.50More Images


1100°C Tube Furnace with Solid Precursor Sublimator for CVD 2D Layers of TMDs - OTF-1200X-4-NW-UL
OTF-1200X-4-NW-UL is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichalcogenides (TMD )such as MoSe2, MoS2... and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter.
Specifications
Furnace and Preheater Pic. 1 Pic. 2 |
|
||
| Rated Voltage | Single Phase, 208-240 VAC, 50/60 Hz, AWG 8# Power cord is included (without plug) | ||
| Power consumption | Max. 3600 W (20 A breaker required) | ||
Heating Zone |
|
||
Working Temperature |
|
||
Temperature Control |
|
||
|
Vacuum and Gas Sealing & Flange |
The right flange of the CVD furnace
|
||
| The optional Liquid Injection device optional) | For direct liquid CVD ( DLCVD), you may consider the below devices for liquid injection: ( click Pic to order ) ![]() |
||
| Net weight |
110kg |
||
| Dimensions |
|
||
| Shipping Weight & Dimensions |
|
||
| Warranty |
|
||
Laptop, software & WiFi Control (Optional) ![]() |
|
||
| Compliance |
|
||
| Warning |
|
||
Operation Demo Video ![]() |
|
||
Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
OTF-1200X-4-NW-UL is a compact 1100°C CVD tube furnace with a precursor sublimating attachment. Totally four-channel gas inlets are built on the sublimation which allows feedings of various gases to carry the source vapor into the main heater for further decomposition and deposition. The sample holder fixture mounted on the right flange is slidable for easy sample loading/unloading. Such a system configuration is suitable for growing a wide range of transitional metal dichalcogenides (TMD )such as MoSe2, MoS2... and wide bandgap semiconductors (such as h-BN) layers on substrate up to 3" diameter.
Specifications
Furnace and Preheater Pic. 1 Pic. 2 |
|
||
| Rated Voltage | Single Phase, 208-240 VAC, 50/60 Hz, AWG 8# Power cord is included (without plug) | ||
| Power consumption | Max. 3600 W (20 A breaker required) | ||
Heating Zone |
|
||
Working Temperature |
|
||
Temperature Control |
|
||
|
Vacuum and Gas Sealing & Flange |
The right flange of the CVD furnace
|
||
| The optional Liquid Injection device optional) | For direct liquid CVD ( DLCVD), you may consider the below devices for liquid injection: ( click Pic to order ) ![]() |
||
| Net weight |
110kg |
||
| Dimensions |
|
||
| Shipping Weight & Dimensions |
|
||
| Warranty |
|
||
Laptop, software & WiFi Control (Optional) ![]() |
|
||
| Compliance |
|
||
| Warning |
|
||
Operation Demo Video ![]() |
|
||
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