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Precision Vacuum Pressure Regulating System with Turbo & Backing Pump (upto 10^-6 Torr) - GZK-PID-103G-LD
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Precision Vacuum Pressure Regulating System with Turbo & Backing Pump (upto 10^-6 Torr) - GZK-PID-103G-LD

Precision Vacuum Pressure Regulating System with Turbo & Backing Pump (upto 10^-6 Torr) - GZK-PID-103G-LD

The GZK-PID-103G-LD is a highly sensitive, compact and PID-controlled vacuum pressure regulating system. The system consists of a mechanical pump and a turbomolecular pump, allowing two different working modes: 1) achieve a high vacuum environment by the turbopump; 2) control the output of gas flow by the mechanical pump and the PID system to keep the pressure at a constant level. This system comes with a pressure measuring transducer for precise pressure monitoring. The system is compatible with MTI furnaces to achieve ideal pressure conditions for PVD, CVD, PECVD and HPCVD processes. This system has been widely used for applications such as diffusion, oxidization, expitaxy, CVD, plasma sputtering, coating and optical fiber melting.

Specifications

    Power Requirement
  • 208 ~ 240 VAC, single phase, 50 ~ 60 Hz.
  • Input power: 1.2 kW.
    Vacuum pump system Mechanical pump
  • Pumping capacity: 400 liters per minutes.
  • Ambient temperature: 5 ~ 40 °C (40 ~ 105 F).
  • Noise level: 58 dB.
Turbomolecular pump
  • Pumping capacity: 6600 liters per minutes.
  • Ultimate pressure: 4.5 × 10^-3 mTorr.
  • Startup pressure: 750 mTorr.
  • Rotation speed: 42300 rpm.
Pumps are connected by KF-40 port.
    Pressure Monitoring System
  • Anti-Corrosive Capacitance Diaphragm Gauge (EQ-PGC-554-LD). 
  • Pressure range: 3.8 × 10^-5 ~ 1125 Torr.
            
    Pressure Control System
   
    		 Pressure control sensitivity (argon as input gas):
  • 760 mTorr (100 Pa) ~ 225 Torr (30000 Pa) with 500 sccm argon gas;
  • 600 mTorr (80 Pa) ~ 200 Torr (26660 Pa) with 300 sccm argon gas;
  • 300 mTorr (40 Pa) ~ 185 Torr (24660 Pa) with 100 sccm argon gas;
  • 180 mTorr (24 Pa) ~ 100 Torr (13333 Pa) with 50 sccm argon gas.
Pressure control accuracy:
  • 180 mTorr ~ 2.5 Torr (<±5% of reading);
  • 2.5 Torr ~ 10 Torr (<±4% of reading);
  • 10 Torr ~ 200 Torr (<±2% of reading);
    Product Dimension
  • 600 × 745 × 700 mm (L × W × H).
    Weight 
  • ~80 kg (175 lbs.).
    Warranty
  • One-year limited warranty with lifetime support.
    Applications
  • It is recommended that attach GZK-PID-103G on other MTI products, such as tube furnaces, CVD, PECVD and HPCVD systems.
  • This system is compatible with our magnetron sputtering deposition system.
    Operation Instructions            
$10,148.25

Original: $28,995.00

-65%
Precision Vacuum Pressure Regulating System with Turbo & Backing Pump (upto 10^-6 Torr) - GZK-PID-103G-LD—

$28,995.00

$10,148.25

Precision Vacuum Pressure Regulating System with Turbo & Backing Pump (upto 10^-6 Torr) - GZK-PID-103G-LD

The GZK-PID-103G-LD is a highly sensitive, compact and PID-controlled vacuum pressure regulating system. The system consists of a mechanical pump and a turbomolecular pump, allowing two different working modes: 1) achieve a high vacuum environment by the turbopump; 2) control the output of gas flow by the mechanical pump and the PID system to keep the pressure at a constant level. This system comes with a pressure measuring transducer for precise pressure monitoring. The system is compatible with MTI furnaces to achieve ideal pressure conditions for PVD, CVD, PECVD and HPCVD processes. This system has been widely used for applications such as diffusion, oxidization, expitaxy, CVD, plasma sputtering, coating and optical fiber melting.

Specifications

    Power Requirement
  • 208 ~ 240 VAC, single phase, 50 ~ 60 Hz.
  • Input power: 1.2 kW.
    Vacuum pump system Mechanical pump
  • Pumping capacity: 400 liters per minutes.
  • Ambient temperature: 5 ~ 40 °C (40 ~ 105 F).
  • Noise level: 58 dB.
Turbomolecular pump
  • Pumping capacity: 6600 liters per minutes.
  • Ultimate pressure: 4.5 × 10^-3 mTorr.
  • Startup pressure: 750 mTorr.
  • Rotation speed: 42300 rpm.
Pumps are connected by KF-40 port.
    Pressure Monitoring System
  • Anti-Corrosive Capacitance Diaphragm Gauge (EQ-PGC-554-LD). 
  • Pressure range: 3.8 × 10^-5 ~ 1125 Torr.
            
    Pressure Control System
   
    		 Pressure control sensitivity (argon as input gas):
  • 760 mTorr (100 Pa) ~ 225 Torr (30000 Pa) with 500 sccm argon gas;
  • 600 mTorr (80 Pa) ~ 200 Torr (26660 Pa) with 300 sccm argon gas;
  • 300 mTorr (40 Pa) ~ 185 Torr (24660 Pa) with 100 sccm argon gas;
  • 180 mTorr (24 Pa) ~ 100 Torr (13333 Pa) with 50 sccm argon gas.
Pressure control accuracy:
  • 180 mTorr ~ 2.5 Torr (<±5% of reading);
  • 2.5 Torr ~ 10 Torr (<±4% of reading);
  • 10 Torr ~ 200 Torr (<±2% of reading);
    Product Dimension
  • 600 × 745 × 700 mm (L × W × H).
    Weight 
  • ~80 kg (175 lbs.).
    Warranty
  • One-year limited warranty with lifetime support.
    Applications
  • It is recommended that attach GZK-PID-103G on other MTI products, such as tube furnaces, CVD, PECVD and HPCVD systems.
  • This system is compatible with our magnetron sputtering deposition system.
    Operation Instructions            

Product Information

Shipping & Returns

Description

The GZK-PID-103G-LD is a highly sensitive, compact and PID-controlled vacuum pressure regulating system. The system consists of a mechanical pump and a turbomolecular pump, allowing two different working modes: 1) achieve a high vacuum environment by the turbopump; 2) control the output of gas flow by the mechanical pump and the PID system to keep the pressure at a constant level. This system comes with a pressure measuring transducer for precise pressure monitoring. The system is compatible with MTI furnaces to achieve ideal pressure conditions for PVD, CVD, PECVD and HPCVD processes. This system has been widely used for applications such as diffusion, oxidization, expitaxy, CVD, plasma sputtering, coating and optical fiber melting.

Specifications

    Power Requirement
  • 208 ~ 240 VAC, single phase, 50 ~ 60 Hz.
  • Input power: 1.2 kW.
    Vacuum pump system Mechanical pump
  • Pumping capacity: 400 liters per minutes.
  • Ambient temperature: 5 ~ 40 °C (40 ~ 105 F).
  • Noise level: 58 dB.
Turbomolecular pump
  • Pumping capacity: 6600 liters per minutes.
  • Ultimate pressure: 4.5 × 10^-3 mTorr.
  • Startup pressure: 750 mTorr.
  • Rotation speed: 42300 rpm.
Pumps are connected by KF-40 port.
    Pressure Monitoring System
  • Anti-Corrosive Capacitance Diaphragm Gauge (EQ-PGC-554-LD). 
  • Pressure range: 3.8 × 10^-5 ~ 1125 Torr.
            
    Pressure Control System
   
    		 Pressure control sensitivity (argon as input gas):
  • 760 mTorr (100 Pa) ~ 225 Torr (30000 Pa) with 500 sccm argon gas;
  • 600 mTorr (80 Pa) ~ 200 Torr (26660 Pa) with 300 sccm argon gas;
  • 300 mTorr (40 Pa) ~ 185 Torr (24660 Pa) with 100 sccm argon gas;
  • 180 mTorr (24 Pa) ~ 100 Torr (13333 Pa) with 50 sccm argon gas.
Pressure control accuracy:
  • 180 mTorr ~ 2.5 Torr (<±5% of reading);
  • 2.5 Torr ~ 10 Torr (<±4% of reading);
  • 10 Torr ~ 200 Torr (<±2% of reading);
    Product Dimension
  • 600 × 745 × 700 mm (L × W × H).
    Weight 
  • ~80 kg (175 lbs.).
    Warranty
  • One-year limited warranty with lifetime support.
    Applications
  • It is recommended that attach GZK-PID-103G on other MTI products, such as tube furnaces, CVD, PECVD and HPCVD systems.
  • This system is compatible with our magnetron sputtering deposition system.
    Operation Instructions            
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