
ZnO Film (0.5 um) on Sapphire(0001), 10x10x0.5mm,1sp, undoped - FmZnOonAl2O3c101005S1US
ZnO Template Specifications:
-
Film: ZnO
- Film thickness: 500 nm ( 0.5 um)
- Total Thickness Variation: 5%
- Resistivity: 10--1000 ohm-cm
- Film orientation: <0001>
- Film quality: as grown < Directioanl grown along <0001> with 50 arc seconds by double crystal x-ray diffraction
-
Al2O3 substrate
10 x 10 x 0.5 mm , <0001>orientation - Polish: one side polished
- Surface roughness: < 5A
- Optional: you may need tool below to handle the wafer ( click picture to order )
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Original: $349.00
-65%$349.00
$122.15ZnO Film (0.5 um) on Sapphire(0001), 10x10x0.5mm,1sp, undoped - FmZnOonAl2O3c101005S1US
ZnO Template Specifications:
-
Film: ZnO
- Film thickness: 500 nm ( 0.5 um)
- Total Thickness Variation: 5%
- Resistivity: 10--1000 ohm-cm
- Film orientation: <0001>
- Film quality: as grown < Directioanl grown along <0001> with 50 arc seconds by double crystal x-ray diffraction
-
Al2O3 substrate
10 x 10 x 0.5 mm , <0001>orientation - Polish: one side polished
- Surface roughness: < 5A
- Optional: you may need tool below to handle the wafer ( click picture to order )
Related Products
![]() |
|||||
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |
Product Information
Product Information
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Description
ZnO Template Specifications:
-
Film: ZnO
- Film thickness: 500 nm ( 0.5 um)
- Total Thickness Variation: 5%
- Resistivity: 10--1000 ohm-cm
- Film orientation: <0001>
- Film quality: as grown < Directioanl grown along <0001> with 50 arc seconds by double crystal x-ray diffraction
-
Al2O3 substrate
10 x 10 x 0.5 mm , <0001>orientation - Polish: one side polished
- Surface roughness: < 5A
- Optional: you may need tool below to handle the wafer ( click picture to order )
Related Products
![]() |
|||||
Thin Films A-Z |
Crystal wafer A-Z |
Plasma Cleaner |
Wafer Containers |
Dicing saw |
Film Coater |











