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800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE
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800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

ALD-800X-4-PE is a compact plasma-enhanced atomic layer deposition (PE-ALD) system with five high-frequency valves, 4" shower head, and rotary heatable sample stage, and a 300 W RF generator. The PE-ALD processes can be realized by the screen panel control system and laptop software control system. This PE-ALD has several advantages, such as a wide range of precursor selection and operation temperature windows (especially good for heat-sensitive material at low temperatures), uniform coating with rotary stage, and low cost.

SPECIFICATIONS:

Power
  • 208 - 240VAC, single phase, 50/60 Hz
  • 9.5 kW total (required for all heating parts and plasma to work properly)

Control Panel

 
  • All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage 
  • 13.56MHZ, 100W max. RF plasma power and auto-matching
  • High-frequency ALD valves were used to control pulse duration interval with micro-second precision
  • Control two channels of gas delivery with ±0.2%F.S via MFC
  • Adjust vacuum pressure by controlling the gas flow rate 
  • Other parameters upon request of the customer
  • Please click the picture left to see the control interface
ALD valve
  • One frequency ALD valve
    • Max. frequency on/off: 283 HZ
    • Min. Pulse time: 10 ms
  • Can deliver drying gas or liquid-vapor
Shower Head
  • Material: Aluminium or Stainless steel
  • 4" shower head with 0.5 mm holes
  • 1/4" dia. tube for gas or vapor inlet which connects to ALD valve
  • Special design for uniform distribution of gas or vaper
  •  
Sample Stage
  • 4" diameter rotary and heatable sample stage
  • Speed: 0 - 5 RPM adjustable via the control panel
  • Temperature: Although the operating temperature can be up to as high as 800 , please limit the working temperature < 550 (+/- 5 accuracy) due to precursor deposition issue.  
Chamber
  • Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
    • Please click here to order the Quartz Chamber replacement.
  • SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump
  • KF 25 vacuum port is built-in
Heatable Bubbler
  • Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors
  •      
  • To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended.
  •               
Vacuum Pump 
( optional)
  • A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
Compliance
  • CE certified and NRTLor CSA certification is available upon request at an extra cost.

 

$55,994.75

Original: $159,985.00

-65%
800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE—

$159,985.00

$55,994.75

800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

ALD-800X-4-PE is a compact plasma-enhanced atomic layer deposition (PE-ALD) system with five high-frequency valves, 4" shower head, and rotary heatable sample stage, and a 300 W RF generator. The PE-ALD processes can be realized by the screen panel control system and laptop software control system. This PE-ALD has several advantages, such as a wide range of precursor selection and operation temperature windows (especially good for heat-sensitive material at low temperatures), uniform coating with rotary stage, and low cost.

SPECIFICATIONS:

Power
  • 208 - 240VAC, single phase, 50/60 Hz
  • 9.5 kW total (required for all heating parts and plasma to work properly)

Control Panel

 
  • All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage 
  • 13.56MHZ, 100W max. RF plasma power and auto-matching
  • High-frequency ALD valves were used to control pulse duration interval with micro-second precision
  • Control two channels of gas delivery with ±0.2%F.S via MFC
  • Adjust vacuum pressure by controlling the gas flow rate 
  • Other parameters upon request of the customer
  • Please click the picture left to see the control interface
ALD valve
  • One frequency ALD valve
    • Max. frequency on/off: 283 HZ
    • Min. Pulse time: 10 ms
  • Can deliver drying gas or liquid-vapor
Shower Head
  • Material: Aluminium or Stainless steel
  • 4" shower head with 0.5 mm holes
  • 1/4" dia. tube for gas or vapor inlet which connects to ALD valve
  • Special design for uniform distribution of gas or vaper
  •  
Sample Stage
  • 4" diameter rotary and heatable sample stage
  • Speed: 0 - 5 RPM adjustable via the control panel
  • Temperature: Although the operating temperature can be up to as high as 800 , please limit the working temperature < 550 (+/- 5 accuracy) due to precursor deposition issue.  
Chamber
  • Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
    • Please click here to order the Quartz Chamber replacement.
  • SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump
  • KF 25 vacuum port is built-in
Heatable Bubbler
  • Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors
  •      
  • To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended.
  •               
Vacuum Pump 
( optional)
  • A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
Compliance
  • CE certified and NRTLor CSA certification is available upon request at an extra cost.

 

Product Information

Shipping & Returns

Description

ALD-800X-4-PE is a compact plasma-enhanced atomic layer deposition (PE-ALD) system with five high-frequency valves, 4" shower head, and rotary heatable sample stage, and a 300 W RF generator. The PE-ALD processes can be realized by the screen panel control system and laptop software control system. This PE-ALD has several advantages, such as a wide range of precursor selection and operation temperature windows (especially good for heat-sensitive material at low temperatures), uniform coating with rotary stage, and low cost.

SPECIFICATIONS:

Power
  • 208 - 240VAC, single phase, 50/60 Hz
  • 9.5 kW total (required for all heating parts and plasma to work properly)

Control Panel

 
  • All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage 
  • 13.56MHZ, 100W max. RF plasma power and auto-matching
  • High-frequency ALD valves were used to control pulse duration interval with micro-second precision
  • Control two channels of gas delivery with ±0.2%F.S via MFC
  • Adjust vacuum pressure by controlling the gas flow rate 
  • Other parameters upon request of the customer
  • Please click the picture left to see the control interface
ALD valve
  • One frequency ALD valve
    • Max. frequency on/off: 283 HZ
    • Min. Pulse time: 10 ms
  • Can deliver drying gas or liquid-vapor
Shower Head
  • Material: Aluminium or Stainless steel
  • 4" shower head with 0.5 mm holes
  • 1/4" dia. tube for gas or vapor inlet which connects to ALD valve
  • Special design for uniform distribution of gas or vaper
  •  
Sample Stage
  • 4" diameter rotary and heatable sample stage
  • Speed: 0 - 5 RPM adjustable via the control panel
  • Temperature: Although the operating temperature can be up to as high as 800 , please limit the working temperature < 550 (+/- 5 accuracy) due to precursor deposition issue.  
Chamber
  • Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
    • Please click here to order the Quartz Chamber replacement.
  • SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump
  • KF 25 vacuum port is built-in
Heatable Bubbler
  • Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors
  •      
  • To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended.
  •               
Vacuum Pump 
( optional)
  • A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
Compliance
  • CE certified and NRTLor CSA certification is available upon request at an extra cost.

 

800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE | MTI Online Store